Sputtering film deposition unit
Sputter deposition unit
Sputtering film deposition unit equipped with a magnetron sputtering source and substrate rotation mechanism 【Features】 ○ Achieves excellent film thickness distribution ○ Capable of switching between DC sputtering and RF sputtering ○ Allows deposition of different types of films by incorporating two types of sputtering sources ○ Equipped with reverse sputtering function for substrate cleaning and etching ○ Prevents contamination and dust generation by adopting a two-motion shutter ● For other functions and details, please download the catalog.
- Company：メープル
- Price：Other
